High current ion source
This patent describes an ion source utilizing a vacuum enclosure. It comprises: a cathode; an anode, the anode spaced apart from the cathode, within a first region in the vacuum enclosure; means for producing an electrical arc between the cathode and anode sufficient to vaporize and ionize a portion of the cathode to form a plasma in the first region and to permit travel of the plasma to a second region in the vacuum enclosure, the second region defined to permit physical expansion of the plasma transversely relative to a line between the first and second region, the second region of the vacuum enclosure including a first portion adjacent the first region and a second portion located further outwardly from the first region than the first portion of the second region, the second portion of the second region having a larger transverse dimension than the first portion of second region; means for producing a magnetic field in the second region which flattened the density profile of the plasma in the second region, the magnetic field producing means for including at least one magnetic member extending along the periphery of the second region, the magnetic member being electrically linked to the anode; and means for extracting ions from the expanded plasma in a third region.
- Assignee:
- The Regents of the Univ. of California, Berkeley, CA
- Patent Number(s):
- A; US 4952843
- Application Number:
- PPN: US 7-320475A
- OSTI ID:
- 5635686
- Country of Publication:
- United States
- Language:
- English
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