High current ion source

Patent · Sun Dec 31 23:00:00 EST 1989

OSTI ID:867511

Brown, Ian G ^[1]; MacGill, Robert A ^[2]; Galvin, James E ^[3]

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1. 1088 Woodside Rd., Berkeley, CA 94708
2. 645 Kern St., Richmond, CA 94805
3. 2 Commodore Dr. #276, Emeryville, CA 94608

An ion source utilizing a cathode and anode for producing an electric arc therebetween. The arc is sufficient to vaporize a portion of the cathode to form a plasma. The plasma leaves the generation region and expands through another regon. The density profile of the plasma may be flattened using a magnetic field formed within a vacuum chamber. Ions are extracted from the plasma to produce a high current broad on beam.

• Research Organization: Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA
• DOE Contract Number: AC03-76SF00098
• Assignee: Brown, Ian G. (1088 Woodside Rd., Berkeley, CA 94708);MacGill, Robert A. (645 Kern St., Richmond, CA 94805);Galvin, James E. (2 Commodore Dr. #276, Emeryville, CA 94608)
• Patent Number(s): US 4952843
• OSTI ID: 867511
• Country of Publication: United States
• Language: English

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