High current ion source

Patent · Mon Jan 01 00:00:00 EST 1990

OSTI ID:867511

Brown, Ian G ^[1]; MacGill, Robert A ^[2]; Galvin, James E ^[3]

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1. 1088 Woodside Rd., Berkeley, CA 94708
2. 645 Kern St., Richmond, CA 94805
3. 2 Commodore Dr. #276, Emeryville, CA 94608

An ion source utilizing a cathode and anode for producing an electric arc therebetween. The arc is sufficient to vaporize a portion of the cathode to form a plasma. The plasma leaves the generation region and expands through another regon. The density profile of the plasma may be flattened using a magnetic field formed within a vacuum chamber. Ions are extracted from the plasma to produce a high current broad on beam.

• Research Organization: Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
• DOE Contract Number: AC03-76SF00098
• Assignee: Brown, Ian G. (1088 Woodside Rd., Berkeley, CA 94708);MacGill, Robert A. (645 Kern St., Richmond, CA 94805);Galvin, James E. (2 Commodore Dr. #276, Emeryville, CA 94608)
• Patent Number(s): US 4952843
• OSTI ID: 867511
• Country of Publication: United States
• Language: English

Related Subjects

current
source
utilizing
cathode
anode
producing
electric
therebetween
sufficient
vaporize
portion
form
plasma
leaves
generation
region
expands
regon
density
profile
flattened
magnetic
field
formed
vacuum
chamber
extracted
produce
broad
beam
density profile
vacuum chamber
magnetic field
source utilizing
generation region
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