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Lattice distortions in YBa sub 2 Cu sub 3 O sub 7 minus. delta. thin films grown in situ by sequential ion beam sputtering

Journal Article · · Journal of Applied Physics; (USA)
DOI:https://doi.org/10.1063/1.348892· OSTI ID:5623822
;  [1];  [2]
  1. W. M. Keck Laboratory of Engineering Materials, California Institute of Technology, Pasadena, California 91125 (USA)
  2. Hughes Research Laboratory, Malibu, California 90265 (USA)
We have analyzed epitaxial, {ital c}-axis oriented YBa{sub 2}Cu{sub 3}O{sub 7{minus}{delta}} thin films grown {ital in} {ital situ} by sequential ion-beam sputtering on (100) SiTiO{sub 3} and (100) MgO substrates. X-ray diffraction studies showed the presence of both homogeneous and inhomogeneous lattice distortions along the {ital c}-direction. The {ital c}-axis lattice parameters ranged from 11.72 to 12.00 A. The broadening of the (00{ital l}) Bragg peaks in excess of the broadening due to finite film thickness was found to be due to inhomogeneous lattice distortions. The overall trend in the data shows an increase of the inhomogeneous strains with the enlargement of the {ital c}-axis lattice parameter. The inhomogeneous lattice distortions are interpreted as fluctuations in the {ital c}-axis lattice parameter. The resistive transitions were found to be correlated to the lattice distortions. We show correlations between the midpoint {ital T}{sub {ital c}} and the {ital c}-axis lattice parameter and between the transition widths and the inhomogeneous lattice distortions.
OSTI ID:
5623822
Journal Information:
Journal of Applied Physics; (USA), Journal Name: Journal of Applied Physics; (USA) Vol. 69:9; ISSN 0021-8979; ISSN JAPIA
Country of Publication:
United States
Language:
English