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Application of laser annealing and laser-induced diffusion to photovoltaic conversion

Conference ·
OSTI ID:5618923
High efficiency silicon solar cells can be fabricated by ion implantation followed by pulsed laser annealing. The proper choice of implantation parameters (energy and dose), laser energy density, substrate temperature, etc., and the improvement of the minority carrier diffusion length of the starting material are important factors in obtaining high efficiency cells. Recently, it has been shown that substrate heating during pulsed laser annealing can improve the electrical properties of the emitter regions of solar cells. It has also been found that the open circuit voltage and the fill factor of ion-implanted, laser-annealed cells can be improved by increasing the emitter dopant concentration, whereas the short circuit current remains fairly constant; these results are in only qualitative agreement with theoretical predictions. By using ion implantation followed by laser annealing to form p-n junctions, laser damage gettering to enhance the minority carrier diffusion length, and laser-induced diffusion for incorporating back surface fields, single crystal Si solar cells with efficiencies of over 16% AMI have been obtained. Similar methods are now being applied in the fabrication of polycrystalline cells from Wacker and small-grained (50 ..mu..m) thin-film material. The rationale for these studies and the results obtained to date will be discussed.
Research Organization:
Oak Ridge National Lab., TN (USA)
DOE Contract Number:
W-7405-ENG-26
OSTI ID:
5618923
Report Number(s):
CONF-811224-1; ON: DE82006792
Country of Publication:
United States
Language:
English