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U.S. Department of Energy
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High repetition rate uniform volume transverse electric discharger laser with pulse triggered multi-arc channel switching

Patent ·
OSTI ID:5618153
A high power excimer laser emits a pulsed output at a high repetition rate in the ultraviolet wavelength region and a uniform power output across the laser beam. By subjecting doped silicon wafers to the pulsed laser output, epitaxial regrowth of silicon crystals can be induced to repair damage to the silicon crystal structure which normally occurs during implantation of the dopant materials.
Assignee:
EDB-85-115007
Patent Number(s):
US 4498183
OSTI ID:
5618153
Country of Publication:
United States
Language:
English