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Charge collection in GaAs MESFETs and MODFETs

Conference · · IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (United States)
OSTI ID:5614033
; ;  [1]; ; ;  [2]; ;  [3]
  1. Martin Marietta Labs., Baltimore, MD (United States)
  2. Naval Research Lab., Washington, DC (United States)
  3. Maryland Univ., Baltimore, MD (United States)

This paper reports on a comparison of the amount of charge collected at the drains of GaAs MESFETs irradiated with pulsed laser light and ions and having different gate lengths which shows orders of magnitude more charge collected for 0.1-{mu}m MESFETs than for 1.2-{mu}m MESFETs manufactured using different processes. Analyses of the dependence of the photocurrent pulses on gate and drain voltages, temperature, and light intensity suggest that the enhanced charge collection is primarily due to modulation of the channel width by positive charge trapped in the vicinity of the channel. Enhanced charge collection via channel modulation also occurs in pseudomorphic MODFETs. Pulses with characteristics similar to those produced by laser light, i.e., large amplitudes and long decay times, were obtained when 0.1-{mu}m MESFETs were irradiated with He and Si ions. These results reveal the important role played by traps in determining SEU sensitivity in GaAs MESFETs with shortshort gate lengths.

OSTI ID:
5614033
Report Number(s):
CONF-910751--
Journal Information:
IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (United States), Journal Name: IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (United States) Vol. 38:6; ISSN 0018-9499; ISSN IETNA
Country of Publication:
United States
Language:
English

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