Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Dispersion of the refractive index of InP and ZnTe

Journal Article · · J. Appl. Phys.; (United States)
DOI:https://doi.org/10.1063/1.332218· OSTI ID:5581436
An analytical expression for the real part of the refractive index n near the fundamental absorption edge is given in terms of experimentally known quantities for a given semiconductor. It is derived from a quantum mechanical calculation of the complex dielectric constant which assumes the band structure of the Kane theory. The expression obtained is a function of the band-gap energy, the effective electron and heavy hole masses at the band edge, the spin orbit splitting energy, the carrier concentration for n- or p-type materials, the temperature, and the frequency of the incident radiation. Also involved is the value of n at the fundamental absorption edge, which is not accessible to measurement. However, an equation for n at the absorption edge can be found in terms of experimentally obtainable values of n near the absorption edge and solved to give the desired quantity. The refractive index can then be predicted to a high degree of accuracy over the entire frequency spectrum up to the band edge. In particular, the dispersion near the fundamental absorption edge which has been observed experimentally for a number of III-V and II-VI compounds is predicted and its precise calculation enabled. Within limits of the above statement regarding n at the absorption edge, there are no adjustable parameters involved. This constitutes a significant improvement over previous theories of the refractive index of a semiconductor, which typically involve several adjustable parameters. Theory is compared with available experimental results for InP and ZnTe. A method of determining the heavy hole effective mass from measurement of n in compounds where it is unknown is discussed.
Research Organization:
Department of Physics, Boston University, Boston, Massachusetts 02215
DOE Contract Number:
AC02-79ER10444
OSTI ID:
5581436
Journal Information:
J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 54:4; ISSN JAPIA
Country of Publication:
United States
Language:
English