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U.S. Department of Energy
Office of Scientific and Technical Information

Defects in metal crystals. Progress report, May 1, 1979-April 30, 1980

Technical Report ·
DOI:https://doi.org/10.2172/5572722· OSTI ID:5572722

A broad investigation of the properties of crystal defects in metals and semiconductors was made. Attention during the past year has focused on fundamental properties of point defects (vacancies and self-interstitial atoms); aggregates of point defects (i.e., depleted zones); the range profiles of low-energy (< 1000 eV) implanted /sup 4/He and /sup 1/H in tungsten, the diffusive properties of /sup 4/He and /sup 1/H; the adsorption kinetics and sticking coefficient of hydrogen on tungsten; the imaging of silicon by field-ion microscopy; the chemical analysis of ordered Ni/sub 4/Mo and GaAs - on an atomic scale - via atom-probe field microscopy; and the low-temperature isochronal recovery behavior of ion-irradiated Ni/sub 4/Mo and Pt/sub 3/Co. Heavy use was made of the high-resolution field-ion microscope and the atom-probe field-ion microscope.

Research Organization:
Cornell Univ., Ithaca, NY (USA)
DOE Contract Number:
AC02-76ER03158
OSTI ID:
5572722
Report Number(s):
COO-3158-87
Country of Publication:
United States
Language:
English