Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Surface resistance of YBa sub 2 Cu sub 3 O sub 7 films on SrTiO sub 3 and LaGaO sub 3 substrates

Journal Article · · Applied Physics Letters; (USA)
DOI:https://doi.org/10.1063/1.101621· OSTI ID:5555702

Surface resistance measurements of films of YBa{sub 2}Cu{sub 3}O{sub 7} deposited onto single-crystal substrates of LaGaO{sub 3} and SrTiO{sub 3} have been made at a frequency of 22 GHz. The measurements were made in either a copper or niobium cavity by replacing the end wall with the superconducting film. Typical surface resistance at 20 K are 1--2 m{Omega} for films on LaGaO{sub 3} and 6--8 m{Omega} for films on SrTiO{sub 3}, as measured in the copper cavity. The LaGaO{sub 3} values lie within the sensitivity range of the Cu cavity ({similar to}2 m{Omega}) and can only be considered upper limits. Similar measurements in a Nb superconducting cavity resulted in a surface resistance value of 0.2{plus minus}0.1 m{Omega} at 4 K for the best LaGaO{sub 3}-based film. This value is more than an order of magnitude lower than Cu, and suggests that LaGaO{sub 3}-based films may offer immediate advantages in a number of applications.

OSTI ID:
5555702
Journal Information:
Applied Physics Letters; (USA), Journal Name: Applied Physics Letters; (USA) Vol. 55:9; ISSN APPLA; ISSN 0003-6951
Country of Publication:
United States
Language:
English

Similar Records

Millimeter-wave surface resistance of laser-ablated YBa sub 2 Cu sub 3 O sub 7 minus. delta. superconducting films
Journal Article · Mon Sep 03 00:00:00 EDT 1990 · Applied Physics Letters; (USA) · OSTI ID:6483496

Microwave surface resistance of YBa sub 2 Cu sub 3 O sub 7 thin films on LaAIO sub 3 substrates
Journal Article · Sat Sep 01 00:00:00 EDT 1990 · Journal of Applied Physics; (USA) · OSTI ID:6429978

Epitaxial films of YBa/sub 2/Cu/sub 3/O/sub 7-//sub delta/ on NdGaO/sub 3/, LaGaO/sub 3/, and SrTiO/sub 3/ substrates deposited by laser ablation
Journal Article · Sun Mar 12 23:00:00 EST 1989 · Appl. Phys. Lett.; (United States) · OSTI ID:6228971