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Electrochemical profiling of ion-implanted InP

Journal Article · · J. Electrochem. Soc.; (United States)
DOI:https://doi.org/10.1149/1.2100849· OSTI ID:5554838
A liquid barrier contact to InP utilizing HCl is described which may be used as a routine contact for the evaluation of carrier concentration profiles in ion implanted and annealed samples. The basic characteristics of the InP/HCl barrier were explored for undoped n-type material with carrier concentrations of 5 x 10/sup 15/ and 1.2 x 10/sup 16/ cm/sup -3/, and for S-doped n-type materials with 2 x 10/sup 17/, 2 x 10/sup 18/, and 10/sup 19/ electrons cm/sup -3/. The factors which influence the accuracy and the reproducibility of ion-implanted carrier concentration profiling utilizing this technique, in which the sample is dissolved by an electrolytic Schottky barrier to perform capacitance-voltage profile measurements, are critically examined. Attention is centered upon the capacitance contributions from the edge regions of the electrolyte contact area, and its influence on profile determination. It is shown that the carrier profile evaluation is very sensitive to a small amount of residual damage remaining after implantation and annealing. The possibility of using this technique to detect deep levels induced by the process of implantation and subsequent annealing is shown.
Research Organization:
Dept. of Electrical and Computer Engineering, Univ. of California, Santa Barbara, CA 93106
OSTI ID:
5554838
Journal Information:
J. Electrochem. Soc.; (United States), Journal Name: J. Electrochem. Soc.; (United States) Vol. 134:9; ISSN JESOA
Country of Publication:
United States
Language:
English