Recent developments in reactively sputtered optical thin films

Conference · Tue Dec 01 04:00:00 EST 1981

OSTI ID:5554130

Pawlewicz, W. T.; Martin, P. M.; Hays, D. D.; Mann, I. B.

Highlights of a multiyear effort to develop new or improved thin film optical coating materials through the use of reactive sputtering techniques are presented. Reactive sputtering is shown to be an extremely versatile technique capable of synthesizing broad classes of materials in a straightfoward manner. The exceptional utility of sputtering for preparation of hard coatings such as oxides, nitrides and novel materials based on Si and Ge is described. Some of these coating materials cannot be made by conventional evaporative techniques. Reactive sputtering is shown to allow precise control of coating composition, microstructure and the resulting optical properties. Examples of multilayer coatings such as all-dielectric and dielectric-enhanced mirrors made from reactively sputtered materials are included, and simple yet elegant fabrication techniques are introduced. The reactive sputtering technique and equipment used specifically for optical coatings are briefly described, and comparison is made with the conventional evaporative approach.

• Research Organization: Pacific Northwest Lab., Richland, WA (USA)
• DOE Contract Number: AC06-76RL01830
• OSTI ID: 5554130
• Report Number(s): PNL-SA-9859; CONF-820107-6; ON: DE82007163
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360201 -- Ceramics
Cermets
& Refractories-- Preparation & Fabrication
360601* -- Other Materials-- Preparation & Manufacture
CHALCOGENIDES
COATINGS
HYDRIDES
HYDROGEN COMPOUNDS
OPTICAL PROPERTIES
OXIDES
OXYGEN COMPOUNDS
PHYSICAL PROPERTIES
SILANES
SILICON COMPOUNDS
SILICON OXIDES
SPUTTERING
TITANIUM COMPOUNDS
TITANIUM OXIDES
TRANSITION ELEMENT COMPOUNDS
VAPOR DEPOSITED COATINGS