Processing issues and technologies for optoelectronics-integrated circuits and devices (invited) [Book Chapter]

Conference · Tue Dec 01 04:00:00 EST 1992 · Integrated Optoelectronics for Communication and Processing

DOI:https://doi.org/10.1117/12.2321800· OSTI ID:5515220

Vawter, G. Allen ^[1]

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1. Sandia National Laboratories (SNL-NM), Albuquerque, NM (United States)

The influence of processing on the design of optical devices and optoelectronic integrated circuits is discussed. Process compatibility of devices used as the basis of a complete optoelectronic integrated circuit will be discussed along with some potential optoelectronic integrated circuits employing only phase modulators and couplers. Specific examples of the application of reactive-ion-beam etching in the formation of passive optical waveguide phase modulators, optical interconnects, turning mirrors, and output couplers in GaAs/AlGaAs are given.

• Research Organization: Sandia National Laboratories (SNL-NM), Albuquerque, NM (United States)
• Sponsoring Organization: USDOE
• DOE Contract Number: AC04-76DP00789
• OSTI ID: 5515220
• Report Number(s): SAND--91-0282C; CONF-9109230--2; ON: DE91017451
• Conference Information: Journal Name: Integrated Optoelectronics for Communication and Processing Journal Volume: 1582
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360601 -- Other Materials-- Preparation & Manufacture
42 ENGINEERING
426000* -- Engineering-- Components
Electron Devices & Circuits-- (1990-)
ALUMINIUM ARSENIDES
ALUMINIUM COMPOUNDS
ARSENIC COMPOUNDS
ARSENIDES
ELECTRONIC CIRCUITS
EQUIPMENT
ETCHING
EVALUATION
FIBER OPTICS
GALLIUM ARSENIDES
GALLIUM COMPOUNDS
INTEGRATED CIRCUITS
LIGHT TRANSMISSION
MICROELECTRONIC CIRCUITS
MIRRORS
OPTICAL EQUIPMENT
OPTICAL SYSTEMS
PNICTIDES
SURFACE FINISHING
WAVEGUIDES