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U.S. Department of Energy
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Research on high-efficiency stacked multi-junction amorphous silicon alloy thin-film solar cells. Annual report, 11 October 1983-31 October 1984

Technical Report ·
DOI:https://doi.org/10.2172/5513157· OSTI ID:5513157
This report describes research on high-efficiency, stacked, multijunction a-Si alloy thin-film solar cells during fiscal year 1984. During this period, two reactors were designed, built and operated. The first was capable of depositing a-Si layers on 100-cm/sup 2/ substrates. The second was a six-sector, rotary, plasma reactor, which permitted the growth of two complete p-i-n junctions on a substrate sequentially in separated sectors. This reactor was fully operational after one year, and a-Si:H films were grown in it. State-of-the-art, undoped, a-Si:H films were grown from SiH/sub 4/ and (SiH/sub 4/ + H/sub 2/) mixtures. Doped n- and p-type a-Si: H and a-(Si,C):H films were also grown, as were very high quality, a-(Si,Ge):H films, from (SiH/sub 4/ + GeH/sub 4/ + H/sub 2/) mixtures. During the first year, research concentrated on a-Si: H devices, and a 7.8% efficiency was achieved. The best short-circuit current was about 15 mA/cm/sup 2/; the best open-circuit voltage, 0.8; and the best fill factor, 71%. A proof-of-concept a-(Si,Ge):H cell was made, with 8 mA/cm/sup 2/, an open-circuit voltage of 0.57 V, and a fill factor of 0.43, for an efficiency (under ELH lamp) of 1.8%.
Research Organization:
Spire Corp., Bedford, MA (USA)
DOE Contract Number:
AC02-83CH10093
OSTI ID:
5513157
Report Number(s):
SERI/STR-211-2730; ON: DE85012150
Country of Publication:
United States
Language:
English