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Low-energy sputtering of teflon by oxygen-ion bombardment

Thesis/Dissertation ·
OSTI ID:5504538
The interaction of low energy oxygen ions (12 to 185 eV) with Teflon surfaces has been investigated using both continuous and pulsed produced by this bombardment. Strong signals were observed at 31, 50, and 69 amu, which are attributed to CF, CF{sub 2}, and CF{sub 3} molecules. The data support the conclusion that these molecules are not the direct products of the ion bombardment. Fluorine and carbon atoms are assumed to be the direct products, sputtered with such high velocities that the efficiency for their detection by the mass spectrometer is low. The CF, CF{sub 2}, and CF{sub 3} data obtained with continuous ion bombardment are used to deduce sputter yields (equivalent CF{sub 2} units removed per incident ion). These yields increase from 0.013 at 12 eV to 0.17 at 185 eV.
Research Organization:
Case Western Reserve Univ., Cleveland, OH (United States)
OSTI ID:
5504538
Country of Publication:
United States
Language:
English