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U.S. Department of Energy
Office of Scientific and Technical Information

Deposited-silicon film solar cell

Patent ·
OSTI ID:5494594
This patent describes a thin-film photovoltaic solar cell. It comprises a conductive ceramic substrate containing silicon in the amount of 20 to 90 percent by weight and functioning as a mechanical support and first electrical contact; a silicon dioxide barrier layer over the substrate to provide for reflection of light to minimize back surface recombination and to prevent diffusion of impurities; a multiplicity of openings in the barrier layer occupying less than 5% of the area of the substrate to provide for electrical contact to the substrate; a layer of polycrystalline silicon less than 100 microns thick over the barrier, which includes a p-type region and an n-type region thereon forming a photovoltaic homojunction therebetween; a transparent second electrical contact means applied to the layer of polycrystalline silicon.
Assignee:
AstroPower, Inc., Newark, DE (United States)
Patent Number(s):
A; US 5057163
Application Number:
PPN: US 7-190138
OSTI ID:
5494594
Country of Publication:
United States
Language:
English