Substrate temperature dependence of microcrystallinity in plasma-deposited, boron-doped hydrogenated silicon alloys
Journal Article
·
· Appl. Phys. Lett.; (United States)
The glow-discharge decomposition of silane diluted in hydrogen using diborane as a dopant results in the deposition of p-type microcrystalline silicon films at relatively low temperatures. The conductivity of these films is critically dependent on the substrate temperature when the ratio of silane flow rate to total gas flow rate is 1%. Electron micrographs show that highly conducting films contain numerous clusters of 2.5-nm crystallites that are embedded in an amorphous medium.
- Research Organization:
- Division of Metallurgy and Materials Science, Brookhaven National Laboratory, Upton, New York 11973
- DOE Contract Number:
- AC02-76CH00016
- OSTI ID:
- 5487230
- Journal Information:
- Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 43:11; ISSN APPLA
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
36 MATERIALS SCIENCE
360601 -- Other Materials-- Preparation & Manufacture
360602 -- Other Materials-- Structure & Phase Studies
360603* -- Materials-- Properties
ALLOYS
AMORPHOUS STATE
BORON ADDITIONS
BORON ALLOYS
CHEMICAL REACTIONS
CRYSTAL STRUCTURE
DEPOSITION
DISSOCIATION
ELECTRIC CONDUCTIVITY
ELECTRIC DISCHARGES
ELECTRICAL PROPERTIES
ELEMENTS
FILMS
GLOW DISCHARGES
HYDRIDES
HYDROGEN COMPOUNDS
HYDROGENATION
MATERIALS
MEDIUM TEMPERATURE
MICROSTRUCTURE
ORDER-DISORDER TRANSFORMATIONS
P-TYPE CONDUCTORS
PHASE TRANSFORMATIONS
PHYSICAL PROPERTIES
PLASMA
RF SYSTEMS
SEMICONDUCTOR MATERIALS
SEMIMETALS
SILANES
SILICON
SILICON COMPOUNDS
SUBSTRATES
TEMPERATURE DEPENDENCE
THIN FILMS
360601 -- Other Materials-- Preparation & Manufacture
360602 -- Other Materials-- Structure & Phase Studies
360603* -- Materials-- Properties
ALLOYS
AMORPHOUS STATE
BORON ADDITIONS
BORON ALLOYS
CHEMICAL REACTIONS
CRYSTAL STRUCTURE
DEPOSITION
DISSOCIATION
ELECTRIC CONDUCTIVITY
ELECTRIC DISCHARGES
ELECTRICAL PROPERTIES
ELEMENTS
FILMS
GLOW DISCHARGES
HYDRIDES
HYDROGEN COMPOUNDS
HYDROGENATION
MATERIALS
MEDIUM TEMPERATURE
MICROSTRUCTURE
ORDER-DISORDER TRANSFORMATIONS
P-TYPE CONDUCTORS
PHASE TRANSFORMATIONS
PHYSICAL PROPERTIES
PLASMA
RF SYSTEMS
SEMICONDUCTOR MATERIALS
SEMIMETALS
SILANES
SILICON
SILICON COMPOUNDS
SUBSTRATES
TEMPERATURE DEPENDENCE
THIN FILMS