Laser-induced damage in quartz: A study of the influence of impurities and defects

Journal Article · Tue Mar 01 04:00:00 EST 1988 · J. Appl. Phys.; (United States)

DOI:https://doi.org/10.1063/1.339970· OSTI ID:5484054

Bandyopadhyay, P K; Merkle, L D

It has been observed that samples of high-quality cultured quartz can differ markedly from sample to sample in their resistance to laser-induced catastrophic damage. The bulk damage properties of quartz from several sources have been investigated using both 1064- and 532-nm laser pulses. It is found that the single-pulse damage ''threshold'' is ill defined, indicating considerable inhomogeneity in even the best samples. Neither resistance to damage by a single-pulse nor damage behavior under multiple-pulse irradiation exhibit any correlation with the concentrations of Al or OH, two impurities important to other properties of quartz. Further, the dependence of damage resistance on temperature and on electron irradiation is much weaker than would be expected if Al were important to the damage process. However, there does appear to be a correlation with the density of coarsely spaced defects revealed in the damage morphology and in chemical etching. Thus, it appears that even in high-quality quartz-laser-induced damage is initiated on low-concentration defects, but that the relevant defects are not related to aluminum impurities.

• Research Organization: Physics Department, University of Arkansas, Fayetteville, Arkansas 72701
• OSTI ID: 5484054
• Journal Information: J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 63:5; ISSN JAPIA
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360605* -- Materials-- Radiation Effects
ALUMINIUM
CHALCOGENIDES
CRYSTAL DEFECTS
CRYSTAL STRUCTURE
DAMAGE
ELECTROMAGNETIC RADIATION
ELEMENTS
HYDROXYL RADICALS
LASER RADIATION
METALS
MINERALS
MORPHOLOGY
OXIDE MINERALS
OXIDES
OXYGEN COMPOUNDS
PHYSICAL RADIATION EFFECTS
QUARTZ
RADIATION EFFECTS
RADIATIONS
RADICALS
SILICON COMPOUNDS
SILICON OXIDES