Multiple-pulse laser-induced damage in crystalline and fused quartz. Final report
Technical Report
·
OSTI ID:5969828
This report presents the major results of an exhaustive study of the failure properties of crystalline and fused quartz when irradiated with many pulses of laser light at wavelengths from 1064, to 350 nm. Data is presented which shows that the bulk damage threshold for single-pulse irradiation varies little from one material to another and depends somewhat on the laser wavelength. On the other hand, the multiple-pulse damage properties are highly dependent on material, laser wavelength, spot size, pulse duration and pulse repetition rate. These results and the statistics of the multiple-pulse damage process show that it results from the accumulation of microscopic damage on each sub-catastrophic-damage threshold pulse. The repetition-rate dependence shows that the microscopic damage has a lifetime of the order of tenths of a second, and this suggests that this sort of damage may be the result of transient color-center formation.
- Research Organization:
- University of Southern California, Los Angeles (USA). Center for Laser Studies
- DOE Contract Number:
- AT03-81NE33080
- OSTI ID:
- 5969828
- Report Number(s):
- DOE/NE/33080-T1; ON: DE83015458
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
36 MATERIALS SCIENCE
360605* -- Materials-- Radiation Effects
ABSTRACTS
AMORPHOUS STATE
CHALCOGENIDES
CRYSTAL LATTICES
CRYSTAL STRUCTURE
DOCUMENT TYPES
ELECTROMAGNETIC RADIATION
LASER RADIATION
LEADING ABSTRACT
MINERALS
OXIDE MINERALS
OXIDES
OXYGEN COMPOUNDS
PHYSICAL RADIATION EFFECTS
PULSE TECHNIQUES
QUARTZ
RADIATION EFFECTS
RADIATIONS
SILICON COMPOUNDS
SILICON OXIDES
360605* -- Materials-- Radiation Effects
ABSTRACTS
AMORPHOUS STATE
CHALCOGENIDES
CRYSTAL LATTICES
CRYSTAL STRUCTURE
DOCUMENT TYPES
ELECTROMAGNETIC RADIATION
LASER RADIATION
LEADING ABSTRACT
MINERALS
OXIDE MINERALS
OXIDES
OXYGEN COMPOUNDS
PHYSICAL RADIATION EFFECTS
PULSE TECHNIQUES
QUARTZ
RADIATION EFFECTS
RADIATIONS
SILICON COMPOUNDS
SILICON OXIDES