Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Reproducible growth of low-threshold single and multiple quantum well InGaAs/InP lasers by a novel interlayer growth technique

Journal Article · · Applied Physics Letters; (USA)
DOI:https://doi.org/10.1063/1.101769· OSTI ID:5482255
; ; ;  [1]
  1. AT T Bell Laboratories, Murray Hill, New Jersey 07974 (US)
High quality single (SQW) and multiple (MQW) quantum well InGaAs/InP lasers have been realized for the first time utilizing a newly developed interlayer growth technique. The technique utilizes separate confinement SQW and MQW lasers grown by atmospheric pressure metalorganic vapor phase epitaxy (MOVPE) having 10--20 nm InGaAs well(s) cladded by 50-nm-thick InGaAsP ({lambda}{sub {ital g}}=1.46 {mu}m) waveguide layers. Carrier confinement and interfacial layer perfection are improved by growth of a few monolayers ({similar to}1 nm) of InP at the QW-barrier interface and by using a novel flushing technique between growth of layers of different compositions. Both SQW and MQW lasers exhibit threshold current density of {similar to}2 kA/cm{sup 2}. Buried-heterostructure lasers grown entirely by MOVPE in a two-growth step show threshold current of 18--40 mA and quantum efficiency as high as 21% facet with good linearity up to 15 mW.
OSTI ID:
5482255
Journal Information:
Applied Physics Letters; (USA), Journal Name: Applied Physics Letters; (USA) Vol. 55:9; ISSN APPLA; ISSN 0003-6951
Country of Publication:
United States
Language:
English