Secondary-phase formation and microstructural development in the interaction between SrBi{sub 2}Ta{sub 2}O{sub 9} films and Pt/Ti/SiO{sub 2}/Si substrates
- Department of Chemical Engineering, National Taiwan University, Taipei, Taiwan, Republic of (China)
The phase formation and microstructural development of SrBi{sub 2}Ta{sub 2}O{sub 9} thin films prepared via spin-coating using metalorganic solution on Pt/Ti/SiO{sub 2}/Si substrates have been investigated in this study. The spun-on films started to crystallize from above 550{degree}C and were well crystallized at 800{degree}C. At higher than 850{degree}C a secondary phase having a pyrochlore structure was formed in the films. The analysis of EDS and SIMS confirmed that the interaction between the films and the titanium species which diffused outward from the titanium layer on substrates was the origin for the occurrence of the pyrochlore phase. In addition, varying the thickness of the coated films and platinum layers had remarkable influence on the formation amount of the pyrochlore phase.
- OSTI ID:
- 542189
- Journal Information:
- Journal of Materials Research, Vol. 12, Issue 8; Other Information: PBD: Aug 1997
- Country of Publication:
- United States
- Language:
- English
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