Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Optical absorption and dangling bonds in damaged silicon

Journal Article · · J. Appl. Phys.; (United States)
DOI:https://doi.org/10.1063/1.335908· OSTI ID:5414573
We have examined the optical absorption and spin-resonance signal characteristics of thin layers of silicon damaged by an abrasive process at room temperature. We find an Urbach-like dependence of the subgap absorption and a g = 2.0055 isotropic spin-resonance signal characteristic of silicon dangling bonds. Changes in the optical and spin-resonance data caused by thermal anneals in air, or in atomic hydrogen, indicate that direct electronic transitions of the dangling bond defect are not responsible for the observed optical-absorption spectra. The doping level dependence of these spectra is consistent with the hypothesis that electronic transitions arising from disorder-induced band-tail states cause the subgap absorption.
Research Organization:
Sandia National Laboratories, Albuquerque, New Mexico 87185
DOE Contract Number:
AC04-76DP00789
OSTI ID:
5414573
Journal Information:
J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 58:7; ISSN JAPIA
Country of Publication:
United States
Language:
English