Deep ultraviolet photoresist based on tungsten polyoxometalates and poly(vinyl alcohol) for bilayer photolithography

Journal Article · Sat Feb 29 23:00:00 EST 1992 · Journal of the Electrochemical Society; (United States)

DOI:https://doi.org/10.1149/1.2069303· OSTI ID:5366504

Carls, J C; Argitis, P; Heller, A ^[1]

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1. Dept. of Chemical Engineering, Univ. of Texas at Austin, Austin, TX (US)

In this paper a negative tone deep ultraviolet resist, a mixture of phosphotungstic acid and poly(vinyl alcohol) is described. This resist has {lt}100 mJ cm{sup {minus}2} sensitivity and resolves {le}0.3 {mu}m features. Even though the photochemistry involves chemical amplification, the exposed patterns are stable and the process tolerates hours between the exposure and the post-bake steps. The resist is spun from an aqueous solutio, and its wet processing is also aqueous. This resist is used in a bilayer scheme, where advantage is taken of both the resistance of the tungsten oxide to oxygen plasmas and its easy stripping in fluorine-containing plasmas. Because poly(vinyl alcohol) is intrisincally a wetting agent, pinhole-free resist films of {approximately}1000 {Angstrom} thickness can be spun. These thin coatings provide sufficient oxygen plasma etch resistance to allow patterning of a thick 1.5 {mu}m novolac planarizing layer underneath the resist.

• OSTI ID: 5366504
• Journal Information: Journal of the Electrochemical Society; (United States), Journal Name: Journal of the Electrochemical Society; (United States) Vol. 139:3; ISSN 0013-4651; ISSN JESOA
• Country of Publication: United States
• Language: English

Related Subjects

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
400500 -- Photochemistry
665300* -- Interactions Between Beams & Condensed Matter-- (1992-)
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ALCOHOLS
CHALCOGENIDES
CHEMICAL COATING
CHEMISTRY
DEPOSITION
DISPERSIONS
ELECTRICAL EQUIPMENT
ELECTROCHEMICAL COATING
ELECTROMAGNETIC RADIATION
ELEMENTS
EQUIPMENT
ETCHING
FABRICATION
FLUORINE
HALOGENS
HYDROXY COMPOUNDS
MIXTURES
NONMETALS
ORGANIC COMPOUNDS
OXIDES
OXYGEN
OXYGEN COMPOUNDS
PHOTOCHEMISTRY
PHOTORESISTORS
PLASMA
RADIATIONS
REFRACTORY METAL COMPOUNDS
RESISTORS
SOLID-STATE PLASMA
SURFACE COATING
SURFACE FINISHING
TRANSITION ELEMENT COMPOUNDS
TUNGSTEN COMPOUNDS
TUNGSTEN OXIDES
ULTRAVIOLET RADIATION