Environmentally friendly polysilane photoresists
Conference
·
OSTI ID:229373
- Sandia National Labs., Albuquerque, NM (United States)
- Stanford Univ., CA (United States). Dept. of Chemistry
Several novel polysilanes synthesized by the free-radical hydrosilation of oligomeric polyphenylsilane or poly(p-tert- butylphenylsilane) were examined for lithographic behavior. This recently developed route into substituted polysilanes has allowed for the rational design of a variety of polysilanes with a typical chemical properties such as alcohol and aqueous base solubility. Many of the polysilane resists made could be developed in aqueous sodium carbonate and bicarbonate solutions. These materials represent environmentally friendly polysilane resists in both their synthesis and processing.
- Research Organization:
- Sandia National Labs., Albuquerque, NM (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- AC04-94AL85000
- OSTI ID:
- 229373
- Report Number(s):
- SAND--95-1997C; CONF-950402--17; ON: DE96010706
- Country of Publication:
- United States
- Language:
- English
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