Design of photoresists with reduced environmental impact. 1: Water-soluble resists based on photo-cross-linking of poly(vinyl alcohol)
- Univ. of California, Berkeley, CA (United States). Dept. of Chemistry
- Univ. of Texas, Austin, TX (United States). Dept. of Chemistry
- SEMATECH, Austin, TX (United States)
Various approaches to environmentally improved photoresist materials have been reported in the literature. The feasibility of a chemically amplified fully water-soluble negative-tone resist based upon the cross-linking of a poly(vinyl alcohol) (PVA) matrix resin has been demonstrated. Two-component resists incorporating PVA and (2,4-dihydroxyphenyl)dimethylsulfonium triflate as a water-soluble photoacid generator were formulated in deionized water and spin-coated onto bare silicon wafers. Negative-tone images were obtained upon irradiation at 254 nm, postbaking, and subsequent development in pure water. The two-component resist suffered from swelling during development, but improved performance was obtained through the addition of a cross-linking agent, hexamethoxymethylmelamine (HMMM). The resulting three-component, water-soluble resist was able to resolve micron-sized images using a 248 nm stepper, at a dose of ca. 200 mJ/cm{sup 2}. Model studies conducted using {sup 13}C NMR monitoring with 2,4-pentanediol as a model for PVA showed that under acidic catalysis HMMM reacts to form active electrophilic species that add to the diol, affording ether linkages with concomitant liberation of methanol.
- OSTI ID:
- 338386
- Journal Information:
- Chemistry of Materials, Journal Name: Chemistry of Materials Journal Issue: 3 Vol. 11; ISSN CMATEX; ISSN 0897-4756
- Country of Publication:
- United States
- Language:
- English
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