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GaAs; GaAlAs ridge waveguide lasers and their monolithic integration using the ion beam etching process

Journal Article · · IEEE (Institute of Electrical and Electronics Engineers) Journal of Quantum Electronics; (USA)
DOI:https://doi.org/10.1109/3.42050· OSTI ID:5365515
; ;  [1]
  1. Laboratoire de Bagneux, Centre National d'Etudes des Telecommunications, 92220 Bagneux (FR)
The authors detail the fabrication process of GaAs/GaAlAs ridge waveguide lasers and present their performance characteristics. Threshold currents as low as 8 mA and differential quantum efficiencies as high as 90 percent have been obtained for 250 {mu}m long GRIN-SCH SQW lasers. High-speed short-cavity ridge waveguide lasers for which both the ridge stripe and one mirror facet were formed by Ar-ion beam etching have been achieved. The dependance of threshold current and lasing spectra on the cavity length have been theoretically and experimentally investigated. This process has been successfully used to monolithically integrate a laser diode (LD) with a photodiode (PD) or a field-effect transistor (FET).
OSTI ID:
5365515
Journal Information:
IEEE (Institute of Electrical and Electronics Engineers) Journal of Quantum Electronics; (USA), Journal Name: IEEE (Institute of Electrical and Electronics Engineers) Journal of Quantum Electronics; (USA) Vol. 25:11; ISSN 0018-9197; ISSN IEJQA
Country of Publication:
United States
Language:
English