The relationship between the MOCVD parameters and the crystallinity, epitaxy, and domain structure of PbTiO[sub 3] films
- Materials Science Division, Argonne National Laboratory, Argonne, Illinois 60439-4838 (United States)
Lead- and titanium-based oxide thin films were prepared by the metal-organic chemical vapor deposition technique (MOCVD) and the relationship between the film structures and the processing parameters, such as the ratio of Pb/Ti precursors in the gas phase, substrate materials, substrate surface orientation, and growth temperature, was systematically studied. It was found that whether a single-phase stoichiometric PbTiO[sub 3] film could be obtained depended on both the Pb/Ti precursor ratio in the gas phase and the deposition temperature. Under appropriate conditions, stoichiometric PbTiO[sub 3] films could be obtained on all the substrates including silicon, MgO, [alpha]--Al[sub 2]O[sub 3], SrTiO[sub 3], and LaAlO[sub 3]. The PbTiO[sub 3] films grown on silicon substrates were always polycrystalline, whereas epitaxial PbTiO[sub 3] films were obtainable on all the other substrates. For epitaxial PbTiO[sub 3] films, the epitaxial relationship, crystallinity, and domain structures were found to be a function of both the substrate materials and surface orientation as well as the deposition temperature. X-ray rocking curves ([omega] scan) of the (100) and (001) planes of PbTiO[sub 3] epitaxial films and PbTiO[sub 3] single crystal revealed the inherent nature of the domain structures in PbTiO[sub 3].
- Research Organization:
- Argonne National Laboratory (ANL), Argonne, IL
- DOE Contract Number:
- W-31109-ENG-38
- OSTI ID:
- 5360873
- Journal Information:
- Journal of Materials Research; (United States), Journal Name: Journal of Materials Research; (United States) Vol. 9:1; ISSN JMREEE; ISSN 0884-2914
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
360202* -- Ceramics
Cermets
& Refractories-- Structure & Phase Studies
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
COHERENT SCATTERING
DEPOSITION
DIFFRACTION
DOMAIN STRUCTURE
EPITAXY
FILMS
LEAD COMPOUNDS
MICROSTRUCTURE
OXYGEN COMPOUNDS
SCATTERING
SURFACE COATING
THIN FILMS
TITANATES
TITANIUM COMPOUNDS
TRANSITION ELEMENT COMPOUNDS
X-RAY DIFFRACTION