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Structure and carrier lifetime in LT-GaAs

Journal Article · · Journal of Electronic Materials
DOI:https://doi.org/10.1007/BF02650000· OSTI ID:535224
 [1]; ;  [2]
  1. Lawrence Berkeley Lab., CA (United States)
  2. Univ. of Michigan, Ann Arbor, MI (United States); and others
The relationship between the structural quality of low-temperature GaAs layers and the photoexcited carrier lifetime has been studied. Transmission electron microscopy, x-ray rocking curves, time-resolved reflectance methods, and photoconductive-switch-response measurements were used for this study. For a variety of samples grown at temperatures in the vicinity of 200{degrees}C, subpicosecond carrier lifetimes were observed both in as-grown layers, as well as in the same layers after post-annealing and formation of As precipitates. These results suggest that the carrier lifetime, which was found to be shorter in the as-grown layers than in the annealed ones, might be related to the density of As{sub Ga} antisite defects present in the layers. The annealed layers which contained structural defects before annealing appeared to exhibit the longest carrier lifetime due to gathering of As on these defects (and formation of relatively large As precipitates) and depletion of extra As (As{sub Ga}) defects from the layer. It was found as well that the responsivity of detectors fabricated on these layers depended strongly on the structural quality of the layers, with the greatest response obtained not for the layers with the fewest defects, but for the layers with 10{sup 7}-10{sup 8}/cm{sup 2} of pyramidal defects. 14 refs., 4 figs.
Sponsoring Organization:
USDOE
DOE Contract Number:
AC03-76SF00098
OSTI ID:
535224
Journal Information:
Journal of Electronic Materials, Journal Name: Journal of Electronic Materials Journal Issue: 12 Vol. 22; ISSN JECMA5; ISSN 0361-5235
Country of Publication:
United States
Language:
English

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