Time-resolved ellipsometry measurements of the optical properties of silicon during pulsed excimer laser irradiation

Journal Article · Tue Oct 01 04:00:00 EDT 1985 · Appl. Phys. Lett.; (United States)

DOI:https://doi.org/10.1063/1.96014· OSTI ID:5336170

Jellison, Jr, G E; Lowndes, D H

A technique has been developed for continuously carrying out time-resolved ellipsometric measurements on the nanosecond timescale. Using this technique, the optical properties of silicon have been measured during and immediately after pulsed excimer (KrF, lambda = 248 nm) laser irradiation. From these data the optical functions of liquid silicon at lambda = 632.8 nm have been determined to be n = 3.8 and k = 5.2 +- 0.1, in minor disagreement with the results of Shvarev, Baum, and Gel'd (High Temp. 15, 548 (1977)). The surface temperature before and after melting was also continuously determined by comparing these results with elevated constant-temperature measurements of the optical functions. The results demonstrate that time-resolved ellipsometry is a powerful technique for examining changes in optical properties on the nanosecond timescale.

• Research Organization: Solid State Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37830
• DOE Contract Number: AC05-84OR21400
• OSTI ID: 5336170
• Journal Information: Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 47:7; ISSN APPLA
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360603* -- Materials-- Properties
ELECTROMAGNETIC RADIATION
ELEMENTS
ELLIPSOMETRY
EXCIMER LASERS
FLUIDS
GAS LASERS
LASER RADIATION
LASERS
LIQUIDS
MEASURING METHODS
MELTING
OPTICAL PROPERTIES
PHASE TRANSFORMATIONS
PHYSICAL PROPERTIES
RADIATIONS
REFLECTIVITY
SEMIMETALS
SILICON
SPECTRA
SURFACE PROPERTIES
TEMPERATURE EFFECTS
VISIBLE SPECTRA