Synthesis and selected micro-mechanical properties of titanium nitride thin films by the pyrolysis of tetrakis titanium in ammonia

Technical Report · Fri Dec 30 23:00:00 EST 1994

OSTI ID:52842

Bae, Y W; Lee, W Y; Besmann, T M; Blau, P J; Riester, L

Thin films of titanium nitride were chemical vapor deposited on (100)-oriented single-crystal silicon substrates from tetrakis (dimethylamino) titanium, Ti((CH{sub 3}){sub 2}N){sub 4}, and ammonia gas mixtures in a cold-wall reactor at 623 K and 655 Pa. The films were characterized by Auger electron spectroscopy, X-ray diffraction, and transmission electron spectroscopy. The nano-scale hardness of the film, measured by nanoindentation, was 12.7 {plus_minus} 0.6 GPa. The average kinetic friction coefficient against unlubricated, type 440C stainless steel was determined using a computer-controlled friction microprobe to be {approximately}0.43.

• Research Organization: Oak Ridge National Lab., TN (United States)
• Sponsoring Organization: USDOE, Washington, DC (United States); Oak Ridge Inst. for Science and Education, TN (United States)
• DOE Contract Number: AC05-84OR21400
• OSTI ID: 52842
• Report Number(s): CONF-941144--127; ON: DE95010224
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
CHEMICAL REACTORS
CHEMICAL VAPOR DEPOSITION
EXPERIMENTAL DATA
MECHANICAL PROPERTIES
MICROHARDNESS
PROTECTIVE COATINGS
TITANIUM NITRIDES
WEAR RESISTANCE