Nanoscale hardness and microfriction of titanium nitride films deposited from the reaction of tetrakis (dimethylamino) titanium with ammonia
- Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831 (United States)
Nanocrystalline titanium nitride films with very low carbon and oxygen content were deposited on single-crystal silicon substrates from the reaction of tetrakis (dimethylamino) titanium, Ti[(CH{sub 3}){sub 2}N]{sub 4}, with ammonia at 633 K and a pressure of 665 Pa. The film consisted of {similar_to}10 nm grains. The hardness of the film, measured by nanoindentation, was 12.7{plus_minus}0.6 GPa. The average kinetic friction coefficient, against type 440C stainless steel, was determined using a friction microprobe to be 0.43.
- OSTI ID:
- 29240
- Journal Information:
- Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 15 Vol. 66; ISSN 0003-6951; ISSN APPLAB
- Country of Publication:
- United States
- Language:
- English
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