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High-power laser plasma sources: Soft x-ray projection lithography and other applications

Conference · · AIP Conference Proceedings (American Institute of Physics); (United States)
DOI:https://doi.org/10.1063/1.44853· OSTI ID:5266853
; ; ; ;  [1]; ;  [2]
  1. Sandia National Laboratories/California, Livermore, California 94550 (United States)
  2. Sandia National Laboratories/New Mexico, Albuquerque, New Mexico 87185 (United States)

The optimization and use of laser plasma sources to perform soft x-ray projection lithography (SXPL) are described, and examples of 0.1 [mu]m imaging are shown. The deleterious effects of laser plasma target ejecta on nearby multilayer-coated optics and methods to mitigate against its deposition are discussed. Soft x-ray flux and debris generation have been studied for a range of target materials and geometries. We find that the refractory metals Ta and W are efficient soft x-ray radiators and also exhibit the lowest emission of target ejecta. Mass-limited target designs, which employ 0.5 [mu]m-thick metal target layers supported by a 25-[mu]m-thick mylar tape backing, have also been characterized. These are found to radiate as efficiently as their semi-infinite bulk counterparts but generate debris which is less damaging to nearby multilayer-coated optics.

DOE Contract Number:
AC04-76DP00789
OSTI ID:
5266853
Report Number(s):
CONF-9304144--
Journal Information:
AIP Conference Proceedings (American Institute of Physics); (United States), Journal Name: AIP Conference Proceedings (American Institute of Physics); (United States) Vol. 288:1; ISSN APCPCS; ISSN 0094-243X
Country of Publication:
United States
Language:
English