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Low-energy neutral/ion backscattering at As/Si(001)

Journal Article · · J. Vac. Sci. Technol., A; (United States)
DOI:https://doi.org/10.1116/1.575180· OSTI ID:5258338
The surface crystallography of arsenic covered Si(001) has been analyzed by low-energy neutral impact collision ion scattering spectroscopy (NICISS). The 170/sup 0/ backscattered He neutrals and ions have been detected by a time-of-flight technique. The measured data show two well-time-resolved lines for He scattered at Si and As atoms, respectively. Hence NICISS angular pattern for Si and As could be measured simultaneously. Adsorption of arsenic lifts the original 1 x 2 reconstruction of the Si(001) substrate and forms itself a 1 x 2 As overlayer. The As overlayer is well described by a dimer arrangement with an interatomic distance of 2.55 A of the As dimers. From the ion scattering experiment considerable thermal vibrations of the As atoms in the overlayer have been concluded. Best agreement with Monte Carlo trajectory calculations is obtained for a Debye temperature of 120 K.
Research Organization:
IBM T. J. Watson Research Center, Yorktown Heights, New York 10598
OSTI ID:
5258338
Journal Information:
J. Vac. Sci. Technol., A; (United States), Journal Name: J. Vac. Sci. Technol., A; (United States) Vol. 6:3; ISSN JVTAD
Country of Publication:
United States
Language:
English