Reactively magnetron sputtered Hf-N films. I. Composition and structure

Journal Article · Tue Oct 15 04:00:00 EDT 1985 · J. Appl. Phys.; (United States)

DOI:https://doi.org/10.1063/1.335812· OSTI ID:5235350

Johansson, B O; Helmersson, U; Hibbs, M K; Sundgren, J

Thin films of Hf-N, covering the entire composition range from pure Hf to overstoichiometric HfN, have been prepared by reactive magnetron sputtering. The structure of the films has been investigated by x-ray diffraction, transmission electron microscopy, and scanning electron microscopy and the composition has been determined using Auger electron spectroscopy. A solubility of roughly-equal30 at. % nitrogen is found in the ..cap alpha..-Hf region. Above 30 at. % N a multiphase structure consisting of ..cap alpha..-Hf, HfN, Hf/sub 3/N/sub 2/, and/or Hf/sub 4/N/sub 3/ is found, which is not in agreement with the equilibrium structure. In the mononitride region a lattice parameter of roughly-equal4.53 A is observed. This value is slightly higher than reported bulk values due to intrinsic stress in the films. Increasing the nitrogen content above 50 at. % causes a distortion of the cubic symmetry of the lattice. This is first observed as an increase in the (111) interplanar spacing while other spacings decrease. Also a splitting of some reflections occurs at higher nitrogen contents. This phase transition is suggested to be due to a successive change from a cubic to a rhombohedral structure.

• Research Organization: Thin Film Group, Department of Physics and Measurement Technology, Linkoeping University, S-581 83 Linkoeping, Sweden
• OSTI ID: 5235350
• Journal Information: J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Journal Issue: 8 Vol. 58:8; ISSN JAPIA
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360201* -- Ceramics
Cermets
& Refractories-- Preparation & Fabrication
360202 -- Ceramics
Cermets
& Refractories-- Structure & Phase Studies
ALLOYS
ALUMINIUM COMPOUNDS
ALUMINIUM OXIDES
ARGON IONS
AUGER ELECTRON SPECTROSCOPY
CHALCOGENIDES
CHARGED PARTICLES
CHEMICAL COMPOSITION
COATINGS
COHERENT SCATTERING
COLLISIONS
COPPER
CRYSTAL LATTICES
CRYSTAL STRUCTURE
CUBIC LATTICES
DIFFRACTION
ELECTRON MICROSCOPY
ELECTRON SPECTROSCOPY
ELECTRON TUBES
ELECTRONIC EQUIPMENT
ELEMENTS
EQUIPMENT
GLASS
HAFNIUM COMPOUNDS
HAFNIUM NITRIDES
ION COLLISIONS
IONS
IRON ALLOYS
IRON BASE ALLOYS
LATTICE PARAMETERS
MAGNETRONS
METALS
MICROSCOPY
MICROSTRUCTURE
MICROWAVE EQUIPMENT
MICROWAVE TUBES
MORPHOLOGY
NITRIDES
NITROGEN COMPOUNDS
OXIDES
OXYGEN COMPOUNDS
PHASE TRANSFORMATIONS
PNICTIDES
REFRACTORY METAL COMPOUNDS
SCANNING ELECTRON MICROSCOPY
SCATTERING
SOLUBILITY
SOLVENT PROPERTIES
SPECTROSCOPY
SPUTTERING
STEELS
STRESSES
TRANSITION ELEMENT COMPOUNDS
TRANSITION ELEMENTS
TRANSMISSION ELECTRON MICROSCOPY
VAPOR DEPOSITED COATINGS
X-RAY DIFFRACTION