Repetitively pulsed operation of an injection-controlled high-power XeF(C yields A) excimer laser

Journal Article · Fri Feb 01 00:00:00 EST 1991 · IEEE Journal of Quantum Electronics (Institute of Electrical and Electronics Engineers); (United States)

DOI:https://doi.org/10.1109/3.78228· OSTI ID:5232561

Yamaguchi, S; Hofmann, T; Dane, C B; Sauerbrey, R; Wilson, Jr, W L; Tittel, F K ^[1]

---

1. Dept. of Electrical and Computer Engineering, Rice Univ., Houston, TX (US)

In this paper the operation at a 1 Hz repetition frequency for an injection controlled electron-beam pumped XeF (C {yields} A) excimer laser system is reported. A compact, halogen compatible closed flow loop incorporating a transverse in-line fan was used for gas circulation. An improved output-laser energy of 1.2 J per pulse with an intrinsic efficiency of 1.1% was achieved with a large aperture unstable resonator.

• OSTI ID: 5232561
• Journal Information: IEEE Journal of Quantum Electronics (Institute of Electrical and Electronics Engineers); (United States), Vol. 27:2; ISSN 0018-9197
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
EXCIMER LASERS
OPERATION
XENON FLUORIDES
ELECTRON BEAM PUMPING
STIMULATED EMISSION
APERTURES
CAVITY RESONATORS
ENERGY SPECTRA
PULSE TECHNIQUES
ELECTRICAL PUMPING
ELECTRONIC EQUIPMENT
EMISSION
ENERGY-LEVEL TRANSITIONS
EQUIPMENT
FLUORIDES
FLUORINE COMPOUNDS
GAS LASERS
HALIDES
HALOGEN COMPOUNDS
LASERS
OPENINGS
PUMPING
RARE GAS COMPOUNDS
RESONATORS
SPECTRA
XENON COMPOUNDS
426002* - Engineering- Lasers & Masers- (1990-)