Fabrication of high-reflectance Mo--Si multilayer mirrors by planar-magnetron sputtering

Journal Article · Sun Sep 01 04:00:00 EDT 1991 · Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States)

DOI:https://doi.org/10.1116/1.577221· OSTI ID:5196443

Stearns, D G; Rosen, R S ^[1]; Vernon, S P ^[2]

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1. University of California, Lawrence Livermore National Laboratory, Livermore, California (USA)
2. Vernon Applied Physics, P. O. Box 10469, Torrance California (USA)

Molybdenum--silicon multilayer (ML) x-ray mirrors have been fabricated using a direct-current planar magnetron sputtering system. The ML structure has been characterized using x-ray diffraction and high-resolution electron microscopy, and the normal incidence x-ray reflectivity has been measured using synchrotron radiation. A striking dependence of the ML morphology on the sputtering gas pressure is observed, exhibiting a transition from layer growth at lower pressures to columnar growth at higher pressures. Correspondingly, the normal incidence x-ray reflectivity is found to decrease strongly with increasing gas pressure. By depositing Mo--Si ML at low sputtering gas pressures we have achieved a normal incidence reflectivity as high as 61% at 132 A.

• DOE Contract Number: W-7405-ENG-48
• OSTI ID: 5196443
• Journal Information: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States), Journal Name: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States) Vol. 9:5; ISSN 0734-2101; ISSN JVTAD
• Country of Publication: United States
• Language: English

Related Subjects

440600* -- Optical Instrumentation-- (1990-)
47 OTHER INSTRUMENTATION
COATINGS
ELECTRON TUBES
ELECTRONIC EQUIPMENT
ELEMENTS
EQUIPMENT
MAGNETRONS
METALS
MICROWAVE EQUIPMENT
MICROWAVE TUBES
MIRRORS
MOLYBDENUM
OPTICAL PROPERTIES
PHYSICAL PROPERTIES
REFLECTIVE COATINGS
REFLECTIVITY
SEMIMETALS
SILICON
SPUTTERING
SURFACE PROPERTIES
TRANSITION ELEMENTS
X-RAY EQUIPMENT