Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Magnetron sputtering system for fabrication of X-ray multilayer optics

Journal Article · · AIP Conference Proceedings
DOI:https://doi.org/10.1063/1.4732398· OSTI ID:22068988
; ;  [1]
  1. X-ray Optics Section, Indus Synchrotrons Utilization Division, Raja Ramanna Centre For Advanced Technology, Indore-452013 (India)
A specially designed DC/RF magnetron sputtering system has been installed for the development of large area x-ray multilayer (ML) optics at Indus synchrotron radiation facility. A brief description of the system configuration, automation and operating conditions are presented. The system has the capability of fabricating large area (300 Multiplication-Sign 100-mm{sup 2}) X-ray MLs with required accuracy, uniformity and reproducibility. Thin film growth suitable for fabrication of X-ray ML optics has achieved by optimizing the sputtering process parameters. The representative results are presented.
OSTI ID:
22068988
Journal Information:
AIP Conference Proceedings, Journal Name: AIP Conference Proceedings Journal Issue: 1 Vol. 1451; ISSN 0094-243X; ISSN APCPCS
Country of Publication:
United States
Language:
English

Similar Records

Sputter deposition system for controlled fabrication of multilayers
Conference · Sat Jun 01 00:00:00 EDT 1985 · OSTI ID:5205090

Fabrication of high-reflectance Mo--Si multilayer mirrors by planar-magnetron sputtering
Journal Article · Sun Sep 01 00:00:00 EDT 1991 · Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States) · OSTI ID:5196443

Multilayer optical coating fabrication by dc magnetron reactive sputtering
Conference · Thu May 01 00:00:00 EDT 1986 · OSTI ID:5336877