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Optical properties of ion assisted deposited CeO sub 2 films

Journal Article · · Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States)
DOI:https://doi.org/10.1116/1.577171· OSTI ID:5192526
; ; ;  [1]
  1. Instrumentation and Services Unit, Indian Institute of Science, Bangalore, 560 012 (India)
Single layer films of CeO{sub 2} have been deposited both by conventional electron beam evaporation and ion assisted deposition with oxygen and argon ions. A broad beam Kaufman ion source (3 cm diam) has been used to generate the ions. A systematic study has been made on optical properties such as refractive index, extinction coefficient and inhomogeneity of the films as a function of: (1) oxygen partial pressure in the range 1{times}10{sup {minus}4} to 1{times}10{sup {minus}5} mbar. (2) Incidence of oxygen ions with energy in the range 300--700 eV and current density in the range 50--220 {mu}A/cm{sup 2}. (3) Incidence of mixed argon and oxygen ions of different ratios. The refractive index of the films deposited under the influence of ion bombardment showed higher indices than the conventionally evaporated films. The maximum index obtained with an oxygen ion bombardment was 2.3 at an ion energy of 600 eV and current density of 220 {mu}A/cm{sup 2}. The bombardment of the films with a mixed argon--oxygen (25% Ar) ion beam of the same energy and current density was found to further increase the refractive index. The extinction coefficient in both cases was negligible.
OSTI ID:
5192526
Journal Information:
Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States), Journal Name: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States) Vol. 9:6; ISSN JVTAD; ISSN 0734-2101
Country of Publication:
United States
Language:
English