Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Characterization of ion-implantation doping of strained-layer superlattices. II. Optical and electrical properties

Journal Article · · J. Appl. Phys.; (United States)
DOI:https://doi.org/10.1063/1.337796· OSTI ID:5190698
We have investigated the properties of Ga(AsP)/GaP strained-layer superlattices (SLSs) that have been doped by implantation of 1 x 10/sup 15//cm/sup 2/, 75 keV Be/sup +/ followed by controlled-atmosphere annealing at 825 /sup 0/C for 10 min. Our results indicate that doping of these strained-layer superlattices without disordering is a viable process. Liquid-helium temperature photoluminescence suggests a binding energy for the implanted acceptors of 50 meV, consistent with that of beryllium in GaP-based alloys. The implantation-doped regions exhibit room-temperature electrical activation of 15% and hole mobilities of 20 cm/sup 2//V s, consistent with the values expected for type-converted GaP-based alloys. SLS diodes fabricated by this process exhibit excellent rectification properties, with a forward turn-on voltage of approximately 1.8 V and low values of room-temperature reverse leakage current densities. Diodes formed from SLSs with original n-type doping of 1 x 10/sup 17//cm/sup 3/ have typical reverse leakage current densities of 1 x 10/sup -7/ A/cm/sup 2/ at -10 V, despite the depletion region penetrating approximately ten interfaces of the SLS at this bias. Deep-level transient spectroscopy demonstrates the existence of defect centers, whose densities and signatures are similar to those found in ion-implanted GaP. The implanted photodiodes exhibit a wavelength-dependent photoresponse characteristic of grown-junction SLS photodetectors in the same chemical system.
Research Organization:
Sandia National Laboratories, Albuquerque, New Mexico 87111
DOE Contract Number:
AC04-76DP00789
OSTI ID:
5190698
Journal Information:
J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 60:10; ISSN JAPIA
Country of Publication:
United States
Language:
English