1/[ital f] noise and oxide traps in MOSFETS
- Sandia National Laboratories, Dept. 1332, Albuquerque, New Mexico 87185-5800 (United States)
- Oberlin College, Physics Department, Oberlin, Ohio 44074 (United States)
Comparative studies of the 1/[ital f] noise and radiation response of MOS transistors strongly suggest that similar point defects are responsible for their 1/[ital f] noise and radiation-induced oxide-trap charge buildup. A prime candidate for this common defect has been identified in radiation effects studies as an E[prime] (E-prime) center, which is a trivalent Si center in SiO[sub 2] associated with a simple oxygen vacancy. Thus, methods to reduce the number of vacancies in the SiO[sub 2] layer of MOS technologies can dramatically reduce the 1/[ital f] noise of irradiated or [ital unirradiated] MOS devices MOSFETs built with radiation-hardened process techniques show 1/[ital f] noise levels approaching the low levels of JFETs. 1/[ital f] noise measurements can also be used to [ital predict] the oxide-trap charge buildup in MOS electronics in radiation environments, such as those encountered in many military, nuclear reactor, high-energy accelerator, and satellite and spacecraft environments. Using radiation-hardened'' circuits and devices in these applications can dramatically improve the performance of analog MOS electronics.
- DOE Contract Number:
- AC04-76DP00789
- OSTI ID:
- 5188847
- Report Number(s):
- CONF-930866-; CODEN: APCPCS; TRN: 94-005383
- Journal Information:
- AIP Conference Proceedings (American Institute of Physics); (United States), Vol. 285:1; Conference: 12. international conference on noise in physical systems and 1/f fluctuations, St. Louis, MO (United States), 16-20 Aug 1993; ISSN 0094-243X
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
SUPERCONDUCTIVITY AND SUPERFLUIDITY
MOSFET
NOISE
ANNEALING
E CENTERS
GAMMA RADIATION
PHYSICAL RADIATION EFFECTS
SILICON OXIDES
SPECTRAL DENSITY
TRAPS
VACANCIES
CHALCOGENIDES
COLOR CENTERS
CRYSTAL DEFECTS
CRYSTAL STRUCTURE
ELECTROMAGNETIC RADIATION
FIELD EFFECT TRANSISTORS
FUNCTIONS
HEAT TREATMENTS
IONIZING RADIATIONS
MOS TRANSISTORS
OXIDES
OXYGEN COMPOUNDS
POINT DEFECTS
RADIATION EFFECTS
RADIATIONS
SEMICONDUCTOR DEVICES
SILICON COMPOUNDS
SPECTRAL FUNCTIONS
TRANSISTORS
665000* - Physics of Condensed Matter- (1992-)