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Critical parameters in the single-target sputtering of YBa sub 2 Cu sub 3 O sub 7

Journal Article · · Journal of Applied Physics; (United States)
DOI:https://doi.org/10.1063/1.349120· OSTI ID:5172333
; ; ; ;  [1]
  1. Westinghouse Science and Technology Center, 1310 Beulah Road, Pittsburgh, Pennsylvania (USA)
The critical parameters in the single-target magnetron sputtering of YBa{sub 2}Cu{sub 3}O{sub 7} have been identified and sufficiently optimized to allow the reproducible deposition of films with {ital T}{sub {ital c}}'s of {gt}90 K and {ital J}{sub {ital c}}'s of {much gt} 10{sup 6} A/cm{sup 2} at 77 K. It was found that during film growth the bombardment of the YBa{sub 2}Cu{sub 3}O{sub 7} by energetic particles must be minimized and also a stronger oxidizing agent than molecular oxygen must be present to obtain films with these properties. Otherwise, films are deposited that, by x-ray diffraction and energy dispersive x-ray spectroscopy analyses, are indistinguishable from the highest-{ital T}{sub {ital c}} 1:2:3 stoichiometric material but which have critical temperatures of {much lt}90 K. Films need not have 1:2:3 overall stoichiometry to have optimum superconducting properties. In such cases the excess elements are present as second-phase particles.
OSTI ID:
5172333
Journal Information:
Journal of Applied Physics; (United States), Journal Name: Journal of Applied Physics; (United States) Vol. 70:8; ISSN 0021-8979; ISSN JAPIA
Country of Publication:
United States
Language:
English