Vapor deposition of thin films
Patent Application
·
OSTI ID:5167995
A highly pure thin metal film having a nanocrystalline structure and a process of preparing such highly pure thin metal films of, e.g., rhodium, iridium, molybdenum, tungsten, rhenium, platinum, or palladium by plasma assisted chemical vapor deposition of, e.g., rhodium(allyl){sub 3}, iridium(allyl){sub 3}, molybdenum(allyl){sub 4}, tungsten(allyl){sub 4}, rhenium (allyl){sub 4}, platinum(allyl){sub 2}, or palladium(allyl){sub 2} are disclosed. Additionally, a general process of reducing the carbon content of a metallic film prepared from one or more organometallic precursor compounds by plasma assisted chemical vapor deposition is disclosed.
- Research Organization:
- Los Alamos National Lab., NM (United States)
- Sponsoring Organization:
- USDOE; USDOE, Washington, DC (United States)
- DOE Contract Number:
- W-7405-ENG-36
- Assignee:
- Dept. of Energy
- Patent Number(s):
- PATENTS-US-A7593839
- Application Number:
- ON: DE92016533; PPN: US 7-593839
- OSTI ID:
- 5167995
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
36 MATERIALS SCIENCE
METALS
CHEMICAL VAPOR DEPOSITION
THIN FILMS
GRAIN SIZE
INVENTIONS
IRIDIUM
MOLYBDENUM
ORGANOMETALLIC COMPOUNDS
PALLADIUM
PLATINUM
RHENIUM
RHODIUM
SPECTROSCOPY
TUNGSTEN
CHEMICAL COATING
CRYSTAL STRUCTURE
DEPOSITION
ELEMENTS
FILMS
MICROSTRUCTURE
ORGANIC COMPOUNDS
PLATINUM METALS
SIZE
SURFACE COATING
TRANSITION ELEMENTS
360101* - Metals & Alloys- Preparation & Fabrication
METALS
CHEMICAL VAPOR DEPOSITION
THIN FILMS
GRAIN SIZE
INVENTIONS
IRIDIUM
MOLYBDENUM
ORGANOMETALLIC COMPOUNDS
PALLADIUM
PLATINUM
RHENIUM
RHODIUM
SPECTROSCOPY
TUNGSTEN
CHEMICAL COATING
CRYSTAL STRUCTURE
DEPOSITION
ELEMENTS
FILMS
MICROSTRUCTURE
ORGANIC COMPOUNDS
PLATINUM METALS
SIZE
SURFACE COATING
TRANSITION ELEMENTS
360101* - Metals & Alloys- Preparation & Fabrication