Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Josephson tunnel junctions with chemically vapor deposited polycrystalline germanium barriers

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.94803· OSTI ID:5151717
High quality Josephson tunnel junctions have been fabricated whose tunneling barrier is polycrystalline germanium chemically vapor deposited on a NbN base electrode and covered by a Nb counterelectrode. These junctions have excellent characteristics for device applications: values of V/sub m/ (the product of the critical current and the subgap resistance measured at 2 mV and 4.2 K) ranging between 35--48 mV, ideal threshold curves, a steep current rise at the gap voltage, and Josephson current densities from 100 to 1100 A/cm/sup 2/.
Research Organization:
Sperry Research Center, Sudbury, Massachusetts 01776
OSTI ID:
5151717
Journal Information:
Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 44:5; ISSN APPLA
Country of Publication:
United States
Language:
English