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Interface segregation and clustering in strained-layer InGaAs/GaAs heterostructures studied by cross-sectional scanning tunneling microscopy

Journal Article · · Physical Review Letters; (United States)
; ; ;  [1]
  1. Department of Materials Science, University of California at Berkeley, Berkeley, California 94720 (United States) Materials Science Division, Lawrence Berkeley Laboratory, Berkeley, California 94720 (United States) Department of Electrical Engineering and Computer Sciences, University of California at Berkeley, Berkeley, California 94720 (United States)
Interface roughness due to segregation and clustering has been studied in atomic detail for the first time, using a cross-sectional scanning tunneling microscope and its spectroscopic ability to distinguish In and Ga atoms in GaAs/In[sub 0.2]Ga[sub 0.8]As/GaAs strained layers. In the In[sub 0.2]Ga[sub 0.8]As layers, InAs is found to cluster preferentially along the growth direction with each cluster containing 2-3 indium atoms. Indium segregation induced an asymmetrical interface broadening. The interface of GaAs grown on In[sub 0.2]Ga[sub 0.8]As is found to be broadened to about 5--10 atomic layers, while that of InGaAs on GaAs is about 2--4 layers broad.
DOE Contract Number:
AC03-76SF00098
OSTI ID:
5112968
Journal Information:
Physical Review Letters; (United States), Journal Name: Physical Review Letters; (United States) Vol. 72:15; ISSN 0031-9007; ISSN PRLTAO
Country of Publication:
United States
Language:
English