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Title: Aerosol chemical vapor deposition of metal oxide films

Patent Application ·
OSTI ID:5047361

A process of preparing a film of a multicomponent metal oxide including: forming an aerosol from a solution comprised of a suitable solvent and at least two precursor compounds capable of volatilizing at temperatures lower than the decomposition temperature of said precursor compounds; passing said aerosol in combination with a suitable oxygen-containing carrier gas into a heated zone, said heated zone having a temperature sufficient to evaporate the solvent and volatilize said precursor compounds; and passing said volatilized precursor compounds against the surface of a substrate, said substrate having a sufficient temperature to decompose said volatilized precursor compounds whereby metal atoms contained within said volatilized precursor compounds are deposited as a metal oxide film upon the substrate is disclosed. In addition, a coated article comprising a multicomponent metal oxide film conforming to the surface of a substrate selected from the group consisting of silicon, magnesium oxide, yttrium-stabilized zirconium oxide, sapphire, or lanthanum gallate, said multicomponent metal oxide film characterized as having a substantially uniform thickness upon said substrate, and as having a crystalline orientation defined as predominantly C-axis oriented by x-ray diffraction is disclosed.

Research Organization:
Los Alamos National Lab., NM (United States)
Sponsoring Organization:
USDOE; USDOE, Washington, DC (United States)
DOE Contract Number:
W-7405-ENG-36
Assignee:
Dept. of Energy
Patent Number(s):
PATENTS-US-A7509120
Application Number:
ON: DE92017179; PPN: US 7-509120
OSTI ID:
5047361
Country of Publication:
United States
Language:
English