Advanced surface processes for optoelectronics

Conference · Fri Jan 01 04:00:00 EST 1988

OSTI ID:5035677

Bernasek, S L ^[1]; Venkatesan, T ^[2]; Temkin, H ^[3]

---

1. Princeton Univ., NJ (USA)
2. Bellcore, Red Bank, NJ (US)
3. AT and T Bell Labs., Murray Hill, NJ (USA)

The field of opto-electronics is advancing at a rapid pace with the discovery of novel material systems as well as new processing ideas. The last decade has seen the maturing of technologies such as ion implantation of opto-electronic materials, energetic-beam processing of surfaces, epitaxy and heteroepitaxy of lattice matched and non-lattice matched systems, and novel growth techniques such as chemical beam epitaxy and energetic-beam assisted growth. The field has further benefited from understanding metal surface reactions to form controlled barriers, and the development of techniques to fabricate sub-micron structures both above and below the surfaces of solids. The aim of this symposium was to bring together the diverse group of researchers involved in these fields.

• OSTI ID: 5035677
• Report Number(s): CONF-8804226--; ISBN: 0-931837-96-0
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360601 -- Other Materials-- Preparation & Manufacture
42 ENGINEERING
426000* -- Engineering-- Components
Electron Devices & Circuits-- (1990-)
ABSTRACTS
BEAMS
DEPOSITION
DOCUMENT TYPES
ELECTRO-OPTICAL EFFECTS
ELECTRONIC CIRCUITS
ETCHING
FABRICATION
INTEGRATED CIRCUITS
ION BEAMS
LEADING ABSTRACT
MATERIALS
MICROELECTRONIC CIRCUITS
SEMICONDUCTOR MATERIALS
SPUTTERING
SURFACE FINISHING