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Temperature-induced rebound in power MOSFETS

Conference · · IEEE Trans. Nucl. Sci.; (United States)
OSTI ID:5017602
Enhancement-mode n-channel power MOSFETs were investigated for rebound. They received 300 krad(Si) gamma dose under positive gate bias with source and drain grounded. The irradiated transistors were thermally annealed with all terminals shorted or under positive gate bias with drain and source shorted, at temperatures from 60/sup 0/C to 150/sup 0/C. Threshold voltage rebound was observed for some transistor types under certain experimental conditions.
Research Organization:
Semiconductor Electronics Div., National Bureau of Standards, Gaithersburg, MD 20899 (US)
OSTI ID:
5017602
Report Number(s):
CONF-8707112-
Conference Information:
Journal Name: IEEE Trans. Nucl. Sci.; (United States) Journal Volume: NS-34:6
Country of Publication:
United States
Language:
English