Deposition of {bold {ital n}}-type diamondlike carbon by using the layer-by-layer technique and its electron emission properties

Journal Article · Fri Feb 28 23:00:00 EST 1997 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.119076· OSTI ID:495237

Park, K C; Moon, J H; Chung, S J; Jang, J ^[1]; Oh, M H ^[2]; Milne, W I ^[3]

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1. Department of Physics, Kyung Hee University, Dongdaemoon-ku, Seoul 130-701 (Korea)
2. Korea Institute of Science and Technology, Seoul (Korea)
3. University of Cambridge, Cambridge CB2 1PZ (United Kingdom)

We have studied the electron emission behavior of the diamondlike carbon (DLC) films by plasma enhanced chemical vapor deposition using a layer-by-layer deposition, in which the deposition of a thin layer of DLC and a CF{sub 4} plasma exposure on its surface were carried out alternatively. The electron emission current increases with CF{sub 4} plasma exposure time. The increase in emission current appears to be due to the n-type behavior of the DLC. {copyright} {ital 1997 American Institute of Physics.}

• OSTI ID: 495237
• Journal Information: Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 11 Vol. 70; ISSN APPLAB; ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ABSORPTION SPECTRA
CARBON
CHEMICAL VAPOR DEPOSITION
ELECTRON EMISSION
HYDROGEN ADDITIONS
PLASMA
THIN FILMS