Enhancement on field emission characteristics of pulsed laser deposited diamondlike carbon films using Au precoatings
- Electronic Research and Service Organization, ITRI, Hsinchu, 300, Taiwan, Republic of (China)
- Department of Electronic Engineering, National Taiwan Institute of Technology, Taipei, Taiwan, 106, Republic of (China)
- Department of Physics, National Taiwan Normal University, Taipei, Taiwan, 106, Republic of (China)
- Materials Science Center, National Tsing-Hua University, Hsinchu, Taiwan, 300, Republic of (China)
Using Au precoatings has been observed to significantly enhance the field emission properties of diamondlike carbon (DLC) films deposited on Si substrates. The electron emission can be turned on at a low field as 7 V/{mu}m and a large emission current density as 2000 {mu}A/cm{sup 2} can be obtained at 20 V/{mu}m applied field. However, preannealing the Au-coated Si substrates at 500{degree}C for 30 min is necessary to achieve such a performance. Microscopic examination on surface and cross-sectional morphologies of the DLC/Au/Si films using atomic force microscopy and scanning electron microscopy, respectively, in conjunction with the elemental depth profile examination of these films using secondary ion mass spectroscopy, indicated that substantial interdiffusion between DLC, Au, and Si layers has occurred. Such kind of reaction is proposed to lower the resistance for electrons to transport across the interfaces and, thereafter, enhances the field emission properties of the DLC/Au/Si films. {copyright} {ital 1997 American Institute of Physics.}
- OSTI ID:
- 544506
- Journal Information:
- Applied Physics Letters, Vol. 70, Issue 16; Other Information: PBD: Apr 1997
- Country of Publication:
- United States
- Language:
- English
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