Study of thin insulating films using secondary ion emission (in French)
Technical Report
·
OSTI ID:4934814
Thesis. Secondary ion emission from insulating films was investigated using a CASTA(NG-SLODZIAN ion analyzer. Various different aspects of the problem were studied: charge flow across a silica film; the mobilization of sodium during ion bombardment; consequences of the introduction of oxygen on the emission of secondary ions from some solids; determination of the various characteristics of secondary ion emission from silica, silicon nitride and silicon. An example of measurements made using this type of operation is presented: profiles (concentration as a function of depth) of boron introduced by diffusion or implantation in thin films of silica on silicon or silicon nitrlde. Such measurements have applications in microelectronics. The same method of operation was extended to other types of insulating film, and in particular, to the metallurgical study of passivation films formed on the surface of stainless steels. (auth)
- Research Organization:
- CEA Centre d'Etudes Nucleaires de Grenoble, 38 (France)
- Sponsoring Organization:
- Sponsor not identified
- NSA Number:
- NSA-29-008655
- OSTI ID:
- 4934814
- Report Number(s):
- CEA-R--4486
- Country of Publication:
- France
- Language:
- French
Similar Records
The ion sensitivity of boron implanted silicon nitride chemical sensors
Primary-ion charge neutralization in secondary ion mass spectrometry analysis of insulators
Effect of surface reactions of low-energy carbon ions on the secondary electron emission of TiN:O thin films
Journal Article
·
Sun Oct 01 00:00:00 EDT 1989
· Journal of the Electrochemical Society; (USA)
·
OSTI ID:5049948
Primary-ion charge neutralization in secondary ion mass spectrometry analysis of insulators
Journal Article
·
Fri Feb 28 23:00:00 EST 1986
· J. Appl. Phys.; (United States)
·
OSTI ID:6077047
Effect of surface reactions of low-energy carbon ions on the secondary electron emission of TiN:O thin films
Journal Article
·
Fri Jun 01 00:00:00 EDT 2007
· Journal of Applied Physics
·
OSTI ID:20979406