Emission of secondary particles from metals and insulators at impact of slow highly charged ions
Conference
·
OSTI ID:491838
Emission of secondary electrons and ions from clean Au, CxHy-Au, and SiO{sub 2} surfaces at impact of slow (v{approx}0.3 v{sub Bohr}) ions were measured as function of incident ion charge for 1+{le}q{le}75+. Electron yields from thermal SiO{sub 2} films (150 mm on Si) were found to be lower than those from the other two for q>3+. Yields of negative secondary ions from SiO{sub 2} and CxHy-Au were recorded in parallel with electron emission data and exhibit a q{sub 4} dependency on incident ion charge. Direct comparison of collisional and electronic contributions to secondary ion production from SiO{sub 2} films using a beam of charge state equilibrated Xe (at 2.75 keV/u) shows positive and negative secondary ion yield increases with incident ion charge of >400. Results are discussed in relation to key signatures of electronic sputtering by Coulomb explosions.
- Research Organization:
- Lawrence Livermore National Lab., CA (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- W-7405-ENG-48
- OSTI ID:
- 491838
- Report Number(s):
- UCRL-JC--125769; CONF-9609268--3; ON: DE97052569
- Country of Publication:
- United States
- Language:
- English
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